NCK CO., LTD.

a company introduction for NCK CO., LTD. based on publicly available information, identifying its business type and translated into English.

Important Note: This information is based on general knowledge and publicly accessible data about a company named NCK Co., Ltd. in South Korea, which is known in the semiconductor and display materials sector. Specific details might vary or require direct confirmation from the company.

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NCK CO., LTD. (엔씨케이 주식회사) Company Introduction

Business Type:

NCK CO., LTD. is primarily a Manufacturer (Factory). They specialize in the research, development, and production of high-tech materials and components.

Company Overview (Korean - Conceptual Basis):

엔씨케이 주식회사(NCK CO., LTD.)는 대한민국에 기반을 둔 첨단 소재 및 부품 전문 제조 기업입니다. 주로 반도체 및 디스플레이 산업 공정에 필수적인 핵심 소모품과 부품을 개발하고 생산하는 데 주력하고 있습니다.

주요 제품군에는 반도체 웨이퍼 표면을 평탄화하는 데 사용되는 CMP(Chemical Mechanical Polishing/Planarization) 슬러리가 포함되며, 이 외에도 관련 공정에 필요한 다양한 고정밀 부품 및 소재를 생산합니다.

NCK는 자체 연구개발(R&D) 역량을 바탕으로 지속적인 기술 혁신을 추구하며, 고품질의 제품을 안정적으로 공급함으로써 국내외 주요 반도체 및 디스플레이 제조업체들의 핵심 파트너로 자리매김하고 있습니다. 기술력, 품질 관리, 고객 만족을 최우선 가치로 삼고 산업 발전에 기여하는 것을 목표로 합니다.

Business Type Clarification:

NCK는 직접 제품을 연구, 개발, 생산하는 제조업체(공장)이며, 단순 유통이나 중개를 주로 하는 무역상이 아닙니다.

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English Translation:

NCK CO., LTD. Company Introduction

Business Type:

NCK CO., LTD. is primarily a Manufacturer (Factory). They specialize in the R&D and production of advanced materials and components.

Company Overview:

NCK CO., LTD. is an advanced materials and components manufacturing company based in South Korea. It primarily focuses on the development and production of core consumables and parts essential for processes within the semiconductor and display industries.

Its main product lines include CMP (Chemical Mechanical Polishing/Planarization) slurry, which is used for planarizing the surface of semiconductor wafers. Additionally, NCK produces various other high-precision components and materials required for related manufacturing processes.

Leveraging its own Research & Development (R&D) capabilities, NCK pursues continuous technological innovation. By reliably supplying high-quality products, the company has established itself as a key partner to major domestic and international semiconductor and display manufacturers. NCK prioritizes technological expertise, quality control, and customer satisfaction, aiming to contribute to the advancement of the industry.

Business Type Clarification:

NCK is a Manufacturer (Factory) that directly researches, develops, and produces its products, rather than being a trading company primarily focused on distribution or brokerage.

here are the main product categories manufactured and/or sold by NCK CO., LTD. (엔씨케이 주식회사) based on publicly available information, presented in English:

NCK CO., LTD. primarily specializes in advanced materials for the semiconductor and display manufacturing processes. Their key product lines include:

1. CMP Slurry (Chemical Mechanical Planarization Slurry):

Ceria Slurry: Used for polishing oxide layers, particularly in STI (Shallow Trench Isolation) processes.

Silica Slurry: Used for various polishing applications, including ILD (Inter-Layer Dielectric) and metal layers.

Tungsten (W) Slurry: Used for polishing tungsten films, often used for contacts and interconnects.

Copper (Cu) Slurry: Used in the damascene process for polishing copper interconnects.

Other specialized slurries for different materials and process steps.

2. Precursors: High-purity chemical compounds used in thin-film deposition processes like ALD (Atomic Layer Deposition) and CVD (Chemical Vapor Deposition).

Silicon Precursors: Used for depositing silicon-based films (e.g., SiO₂, SiN).

Metal Precursors: Used for depositing various metal or metal oxide/nitride films (e.g., Hafnium (Hf), Zirconium (Zr), Titanium (Ti), Tantalum (Ta) based precursors for high-k dielectrics, barrier layers, or electrodes).

Dopant Precursors: Used to introduce dopants into semiconductor layers.

In summary, NCK CO., LTD. is a key supplier of:

Chemical Mechanical Planarization (CMP) Slurries (various types including Ceria, Silica, Tungsten, Copper)

Thin Film Precursors (for ALD/CVD processes, including Silicon and various Metal precursors)

These materials are critical components in the manufacturing of advanced integrated circuits (semiconductors) and potentially flat-panel displays.