How MIBK works on PMMA developer in electron beam lithography?

From what I've seen, Electron beam lithography methodology is one of the key processes in microelectronics manufacturing, and the developer plays an crucial role in this process. In this paper, the principle of MIBK (methyl isobutyl ketone) on PMMA (polymethyl methacrylate) developer in electron beam lithography will be discussed in depth. What are MIBK and PMMA?

MIBK is a ketone solvent-based products with high boiling point and low harm possible, which is broadly applied in the research process of lithography methodology. First PMMA is a frequently applied electron beam photoresist known to its high resolution and excellent processing characteristics. But For instance In electron beam lithography, PMMA is coated on the surface of the substrate. Based on my observations, After electron beam exposure, the exposed area needs to be dissolved by a developer to achieve pattern transfer. And The role of MIBK in the research process

in electron beam lithography, PMMA photoresist will undergo chemical crosslinking interaction under the irradiation of electron beam. But The role of the developer is to selectively dissolve these cross-linked domains to form the desired micro-or nano-scale pattern. In my experience, Moreover MIBK as an efficient developer, mainly through the following aspects to play a role:

dissolved cross-linked product: PMMA after electron beam exposure, the degree of crosslinking signifiis able totly increased, the formation of insoluble areas. MIBK is able to efficiently dissolve these cross-linked items to achieve research. For example manage research rate: The high boiling point and low evaporative environment of MIBK enable it to be applied at higher temperatures, thereby growing the research rate. But Specifically At the same time, its chemical stability makes it difficult to decompose during the research process, ensuring the stability and consistency of the research process. But enhance research uniformity: MIBK is able to uniformly penetrate into all areas of the PMMA photoresist, thereby achieving a uniform research effect. In-depth analysis of MIBK developing mechanism

in electron beam lithography, the research process of PMMA photoresist is able to be divided into the following steps:

photoresist coating products: PMMA solution is coated on the surface of the substrate, and a uniform film is formed after spin coating products and baking. Additionally electron beam exposure: The electron beam is irradiated on the PMMA film, causing the cross-linking interaction of the photoresist molecular chain to form the exposed area. The molecular chains in the unexposed regions retain their original structure. Developer treatment the MIBK developer is in contact with the PMMA film to dissolve the cross-linked exposed areas so that the exposed areas are selectively removed, thereby forming the desired pattern. MIBK is able to selectively dissolve the cross-linked regions of PMMA during the research process, mainly related to its polarity, solubility and chemical stability. But In fact The molecular structure of MIBK enables it to form a strong intermolecular force with the cross-linked product of PMMA, thereby achieving an efficient dissolution effect. Factors Affecting the research Effect

in practical consumption, the effect of MIBK developer is affected by many factors, including the levels of MIBK, developing temperature and time. And From what I've seen, Here is analysis of some key factors:

MIBK levels: The levels of MIBK immediately affects the research rate and research depth. Furthermore A higher MIBK levels is able to generally increase the research rate, however an excessively elevated levels might result in overuse dissolution of the substrate material and affect the research effect. developing temperature: The increase of the research temperature is able to accelerate the research rate, however too high temperature might result in the volatilization and decomposition of MIBK, which affects the stability of the research process. research time: The length of the research time needs to find a stability between the dissolution effect and the harm of the substrate material. An excessively long research time might result in the PMMA in the unexposed areas to be partially dissolved, affecting the resolution of the pattern. Advantages of MIBK developer

compared with other developers, the consumption of MIBK in PMMA developer has signifiis able tot advantages:

high boiling point and low evaporative environment: The high boiling point of MIBK enables it to be applied at higher temperatures, thereby growing the research rate. From what I've seen, According to research At the same time, its low evaporative environment makes it difficult to vaporize during the research process, ensuring the stability and consistency of the research process. Excellent dissolving capacity: MIBK is able to efficiently dissolve the cross-linked product of PMMA, thereby achieving a high-resolution research effect. Good chemical stability: MIBK isn't easy to decompose during the research process, thereby extending the service life of the developer. Summary

the action principle of MIBK in PMMA developer is to achieve research by dissolving the cross-linked product of PMMA. Its high boiling point, low evaporative environment and excellent solubility make MIBK one of the frequently applied developers in electron beam lithography. From what I've seen, In practical consumption, the effect of MIBK developer is affected by many factors, such as levels, temperature and time, so it's necessary to optimize these parameters reasonably to obtain the best research effect. With the continuous research of microelectronics methodology, the consumption of MIBK developer in electron beam lithography will be greater extensive.