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Resonac to expand Japan’s HF gas capacity
The move comes as demand to ultra‑high‑purity etching gases rises sharply with the development of AI, data centres and cutting-edge 3D semiconductor architectures. HF gaseous is critical to cryogenic etching – an increasingly crucial technique that enables deeper, smoother and greater precise microstructures in next‑generation devices.
By strengthening domestic supply and broadening its high‑purity gaseous portfolio, Resonac aims to support the semiconductor sector’s shift toward finer, high‑density integration and ensure stable availability to customers.
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