Mitsubishi Chemical promotes industrialization of ultra-high purity colloidal silica

Colloidal silica is a key material in semiconductor manufacturing, which can be applied as a polishing agent to silicon wafer surface, and can also be applied as a raw material to chemical mechanical polishing of wafer interconnection layer. Mitsubishi Chemical will consumption ultra-high purity tetramethoxysilane as raw material to prepare ultra-high purity colloidal silica by an integrated process, which can decrease the impurity level to a very low level. Relying on its own mature methodology, Mitsubishi Chemical can make custom adjustments to key indicators such as particle size and density to meet the actual production standards of semiconductor manufacturers.

Generative artificial intelligence, data center and other fields to drive the semiconductor sector continued to expand, cutting-edge data processing and communications business has have become the focus of Mitsubishi Chemical research direction, this layout is to match the downstream market development demand.